发明名称 EXPOSURE HEAD, IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technology which enables better exposure by preventing dust from entering between a light emitting element substrate and a lens array. <P>SOLUTION: An exposure head includes a lens array where lenses are arranged in a first direction, the light emitting element substrate on which light emitting elements that emit light incident to the lenses are arranged, an optically transparent substrate which transmits light emitted from the light emitting element and passed through the lens and where the length in a second direction intersecting the first direction perpendicularly is shorter than the lens array, and a seal member connected with the optically transparent substrate to cover the optically transparent substrate, the lens array and the light emitting element substrate. <P>COPYRIGHT: (C)2011,JPO&INPIT</p>
申请公布号 JP2011083962(A) 申请公布日期 2011.04.28
申请号 JP20090238252 申请日期 2009.10.15
申请人 SEIKO EPSON CORP 发明人 SOWA KEN;IKUMA TAKESHI
分类号 B41J2/44;B41J2/45;B41J2/455;H04N1/036 主分类号 B41J2/44
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