| 摘要 |
An inspection method of transparent articles wherein presence or absence of optical inhomogeneities within the transparent articles can be accurately inspected is provided. In an inspection method of transparent articles used in photolithography, for inspecting whether or not there are in homogeneities within transparent articles (4) formed of transparent material wherein optical properties regionally or locally change with regard to exposure light (specifically, interior defects 16), inspection light having a wavelength of 200 nm or shorter is introduced to the transparent article, and light (15) having a longer wavelength than the inspection light which is regionally or locally emitted is sensed on the optical path over which the inspection light is propagated within the transparent article, thereby detecting presence or absence of optical inhomogeneities within the transparent article.
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