发明名称 METHOD OF MEASUREMENT, INSPECTION APPARATUS AND LITHOGRAPHIC APPARATUS
摘要 <p>Radiation is projected onto a plurality of targets on a substrate. By assuming that the overlay error derivable from asymmetry varies smoothly across the substrate, the number of targets measured can be reduced. This may result in a smaller area of the scribe lane being used by targets for each layer of the substrate.</p>
申请公布号 IL188767(A) 申请公布日期 2011.04.28
申请号 IL20080188767 申请日期 2008.01.14
申请人 ASML NETHERLANDS B.V. 发明人
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