LIQUID SUPPLYING SYSTEM, LIQUID SUPPLYING METHOD AND COATING APPARATUS

摘要

PURPOSE: A liquid supplying system, a liquid supplying method, and a coating device are provided to suppress micro bubbles by reducing the amount of gas inputted to liquid supplied to a coating unit. CONSTITUTION: A buffer tank(3) stores a chemical. A second flow path is connected to the buffer tank to supply the chemical. A third flow path(5-4) is connected to the buffer tank to supply pressured gas. A fourth flow path(5-5) is connected to the buffer tank and a coating unit to supply liquid from the buffer tank to the coating unit. A first flow path and the second flow path are detachably connected to a resin container(17). The gas is supplied to the resin container through the first flow path.