A process and a system for orienting a template in imprint lithography

摘要

A process for imprint lithography comprising the steps of orienting (52, 54) a lithographed template and a substrate in spaced relation to each other so that a gap is created between said template and said substrate; filling (56) said gap with UV curable liquid dispensed either before or after establishing the gap; curing (58) said UV curable liquid within said gap; and separating (60) said template and said substrate so that a pattern is transferred from said template to said substrate leaving desired features thereon. The step of orienting comprises a step (52) of performing course orientation of template and substrate so that a rough alignment of the template and substrate is achieved and then a step (54) of controlling the spacing between the template and substrate so that a relatively uniform gap is created between the two layers. It also disclosed a system for orienting a template with respect to a substrate.