发明名称 Cleaning sheet, carrying member and method of cleaning a substrate
摘要 <p>A cleaning sheet comprising a cleaning layer and a releasable protective film laminated on the cleaning layer, wherein each of the relative intensities of the fragment ions of CH 3 Si + , C 3 H 9 Si + , C 5 H 1 Si 2 O + , C s H 15 Si 3 O 3 + , C 7 H 21 Si 3 O 2 + , CH 3 SiO - , CH 3 SiO 2 - and Si + in the cleaning layer, when the protective film is peeled off the cleaning layer, is 0.1 or less according to time-of-flight secondary ion mass spectrometry, relative to C 2 H 3 + in the case of positive ion or O - in the case of negative ion.</p>
申请公布号 EP2314389(A1) 申请公布日期 2011.04.27
申请号 EP20100016058 申请日期 2004.04.14
申请人 NITTO DENKO CORPORATION 发明人 TERADA, YOSHIO;NAMIKAWA, MAKOTO;UENDA, DAISUKE;FUNATSU, ASAMI
分类号 B08B7/00;H01L21/306;B08B1/00;C11D3/16;C11D17/04;H05K3/26 主分类号 B08B7/00
代理机构 代理人
主权项
地址