发明名称 |
PROCESS FOR PRODUCTION OF AlxGa(1-X)N SINGLE CRYSTAL, AlxGa(1-X)N SINGLE CRYSTAL, AND OPTICS |
摘要 |
<p>A method of producing an Al x Ga (1-x) N (0 < x ‰¤ 1) single crystal (10) is directed to growing an Al x Ga (1-x) N single crystal (10) by sublimation. The method includes the steps of preparing an underlying substrate having a composition ratio x identical to the composition ratio of the Al x Ga (1-x) N single crystal, preparing a raw material of high purity, and growing an Al x Ga (1-x) N single crystal (10) on the underlying substrate by sublimating the raw material. The Al x Ga (1-x) N single crystal (10) has an absorption coefficient less than or equal to 100 cm -1 with respect to light at a wavelength greater than or equal to 250 nm and less than 300 nm, and an absorption coefficient less than or equal to 21 cm -1 with respect to light at a wavelength greater than or equal to 300 nm and less than 350 nm.</p> |
申请公布号 |
EP2314738(A1) |
申请公布日期 |
2011.04.27 |
申请号 |
EP20090773382 |
申请日期 |
2009.06.25 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
ARAKAWA, SATOSHI;SAKURADA, TAKASHI;YAMAMOTO, YOSHIYUKI;SATOH, ISSEI;TANIZAKI, KEISUKE;NAKAHATA, HIDEAKI;MIZUHARA, NAHO;MIYANAGA, MICHIMASA |
分类号 |
C30B29/38;C30B23/06;G02B1/02 |
主分类号 |
C30B29/38 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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