发明名称 PROCESS FOR PRODUCTION OF AlxGa(1-X)N SINGLE CRYSTAL, AlxGa(1-X)N SINGLE CRYSTAL, AND OPTICS
摘要 <p>A method of producing an Al x Ga (1-x) N (0 < x ‰¤ 1) single crystal (10) is directed to growing an Al x Ga (1-x) N single crystal (10) by sublimation. The method includes the steps of preparing an underlying substrate having a composition ratio x identical to the composition ratio of the Al x Ga (1-x) N single crystal, preparing a raw material of high purity, and growing an Al x Ga (1-x) N single crystal (10) on the underlying substrate by sublimating the raw material. The Al x Ga (1-x) N single crystal (10) has an absorption coefficient less than or equal to 100 cm -1 with respect to light at a wavelength greater than or equal to 250 nm and less than 300 nm, and an absorption coefficient less than or equal to 21 cm -1 with respect to light at a wavelength greater than or equal to 300 nm and less than 350 nm.</p>
申请公布号 EP2314738(A1) 申请公布日期 2011.04.27
申请号 EP20090773382 申请日期 2009.06.25
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 ARAKAWA, SATOSHI;SAKURADA, TAKASHI;YAMAMOTO, YOSHIYUKI;SATOH, ISSEI;TANIZAKI, KEISUKE;NAKAHATA, HIDEAKI;MIZUHARA, NAHO;MIYANAGA, MICHIMASA
分类号 C30B29/38;C30B23/06;G02B1/02 主分类号 C30B29/38
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