发明名称 METHOD FOR MANUFACTURING SEMICONDUCTOR CRYSTAL OF NITRIDE OF ELEMENT BELONGING TO GROUP-III, SEMICONDUCTOR SUBSTRATE FORMED OF NITRIDE OF ELEMENT BELONGING TO GROUP-III, AND SEMICONDUCTOR LIGHT EMISSION DEVICE
摘要 <p>The method for producing a group III nitride semiconductor crystal of the invention comprises a step of preparing a seed crystal having a non-polar plane followed by growing a group III nitride semiconductor from the non-polar plane in a vapor phase, wherein the growing step includes growing the group III nitride semiconductor so as to extend in the +C-axis direction of the seed crystal. A group III-V nitride semiconductor crystal having high quality and a large-area non-polar plane can be obtained by the method.</p>
申请公布号 EP2154272(A4) 申请公布日期 2011.04.27
申请号 EP20080764307 申请日期 2008.05.16
申请人 MITSUBISHI CHEMICAL CORPORATION 发明人 FUJITO, KENJI;KIYOMI, KAZUMASA
分类号 C30B29/38;C30B25/20;H01L33/16;H01L33/32 主分类号 C30B29/38
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