发明名称
摘要 <p>PROBLEM TO BE SOLVED: To perform peeling of a wafer having a mirror like surface is vacuum- adsorbed and vacumm-broken with a vacuum tweezer made of quartz glass in such a manner that stress and defects are not generated on the wafer face. SOLUTION: The face of an opening part in a vacuum tweezer adsorbing a wafer is coated with a hard DLC (diamondlike carbon) film having surface smoothness. The thermal expansion coefficient of the DLC film is approximately equal to that of quartz glass, stress on the film is not generated, and the uniform and firm film can be formed.</p>
申请公布号 JP4676589(B2) 申请公布日期 2011.04.27
申请号 JP20000084226 申请日期 2000.03.24
申请人 发明人
分类号 B65G49/07;C23C14/50;B25J15/06;H01L21/205;H01L21/677;H01L21/68 主分类号 B65G49/07
代理机构 代理人
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