CHARGED PARTICLE MULTI-BEAMLET LITHOGRAPHY SYSTEM WITH MODULATION DEVICE.
摘要
The invention relates to a charged-particle multi-beamlet lithography system for transferring a pattern onto the surface of a target. The system includes a beam generator, a beamlet blanker array, a shielding structure and a projection system. The beam generator is arranged for generating a plurality of charged particle beamlets. The beamlet blanker array is arranged for patterning the beamlets. The beamlet blanker array comprises a plurality of modulators and a plurality of light sensitive elements. The light sensitive elements are arranged to receive pattern data carrying light beams and are electrically connected to one or more modulators. The shielding structure is of an electrically conductive material for substantially shielding electric fields generated in proximity of the light sensitive elements from the modulators. The shielding structure is arranged to be set at a predetermined potential. The projection system is arranged for projecting the patterned beamlets onto the target surface.
申请公布号
NL2005584(A)
申请公布日期
2011.04.27
申请号
NL20102005584
申请日期
2010.10.26
申请人
MAPPER LITHOGRAPHY IP B.V.,
发明人
WIELAND, MARCO JAN-JACO;JAGER, REMCO;VEEN, ALEXANDER HENDRIK VINCENT;STEENBRINK, STIJN WILLEM HERMAN KAREL