发明名称 Stereolithographic method and apparatus
摘要 A method and an apparatus includes using a planar plotting mask which can continuously change a mask image; continuously moving the planar plotting mask with reference to the surface of the photocurable resin composition and exposing the surface of a photocurable resin composition to light by way of the planar plotting mask while continuously changing a mask image of the planar plotting mask in accordance with a cross-sectional profile pattern of an optically-cured resin layer to be formed and in synchronism with movement of the planar plotting mask, to thus form an optically-cured resin layer having a predetermined cross-sectional profile pattern; and performing building operation such that boundary areas among adjacent plotted areas in the optically-cured resin layer become unnoticeable in a finally-obtained stereolithographic three-dimensional object.
申请公布号 US7931851(B2) 申请公布日期 2011.04.26
申请号 US20060570232 申请日期 2006.02.28
申请人 NABTESCO CORPORATION 发明人 UENO TAKAKUNI
分类号 B29C35/04;B29C67/00 主分类号 B29C35/04
代理机构 代理人
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