发明名称 Process-variation tolerant diode, standard cells including the same, tags and sensors containing the same, and methods for manufacturing the same
摘要 Process variation-tolerant diodes and diode-connected thin film transistors (TFTs), printed or patterned structures (e.g., circuitry) containing such diodes and TFTs, methods of making the same, and applications of the same for identification tags and sensors are disclosed. A patterned structure comprising a complementary pair of diodes or diode-connected TFTs in series can stabilize the threshold voltage (Vt) of a diode manufactured using printing or laser writing techniques. The present invention advantageously utilizes the separation between the Vt of an NMOS TFT (Vtn) and the Vt of a PMOS TFT (Vtp) to establish and/or improve stability of a forward voltage drop across a printed or laser-written diode. Further applications of the present invention relate to reference voltage generators, voltage clamp circuits, methods of controlling voltages on related or differential signal transmission lines, and RFID and EAS tags and sensors.
申请公布号 US7932537(B2) 申请公布日期 2011.04.26
申请号 US20090424509 申请日期 2009.04.15
申请人 KOVIO, INC. 发明人 SUBRAMANIAN VIVEK;SMITH PATRICK
分类号 H01L29/70 主分类号 H01L29/70
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