发明名称 MAGNETRON SPUTTER CATHODE, AND FILMING APPARATUS
摘要 A magnetron sputtering cathode includes: a yoke; a magnetic circuit having a central magnet portion, a peripheral edge magnet portion, an auxiliary magnet portion, and a parallel area; and a backing plate. The central magnet portion, the peripheral edge magnet portion, and the auxiliary magnet portion are disposed so that polarities of tip portions of the central magnet portion, the peripheral edge magnet portion, and the auxiliary magnet portion are different from each other at portions between adjacent magnet portions. The magnetic field profile observed from above of the backing plate and the magnetic flux density in a horizontal direction are determined so that the magnetic flux density in a first area is a positive value and the magnetic flux density in a second area is a negative value with respect to a position corresponding to the central magnet portion as a boundary.
申请公布号 KR20110042238(A) 申请公布日期 2011.04.25
申请号 KR20117006240 申请日期 2009.08.28
申请人 ULVAC, INC. 发明人 TAKAHASHI HIROHISA;YAMADA SHINYA;ISHIBASHI SATORU;SAKUMA KOUHEI
分类号 C23C14/35;H01L21/203;H01L21/285 主分类号 C23C14/35
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