发明名称 PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC ELECTROLUMINESCENCE DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE
摘要 <p>PURPOSE: A photosensitive resin composition, a method for forming a cured film, the cured film, an organic electroluminescent display device, and a liquid crystal display device are provided to obtain the superior the forming property of a contact hole and the sputtering quality of an indium thin oxide. CONSTITUTION: A photosensitive resin composition includes copolymer, a photoacid generator, a compound, and a solvent. The compound includes at least two partial structures represented chemical formula c1. The molecular weight of the compound is between 600 and 2,000. The copolymer includes a first monomer unit and a second monomer unit. The first monomer unit includes moiety, in which carboxylic group is protected by acid-labile group, or moiety, in which phenolic hydroxyl group is protective by acid-labile group. The second monomer unit includes crosslinkable group. In the chemical formula c1, R1 and R2 are methyl group or tert-butyl group. Either of R1 or R2 is tert-butyl group. R3 is -O- or -NH-.</p>
申请公布号 KR20110042008(A) 申请公布日期 2011.04.22
申请号 KR20100100224 申请日期 2010.10.14
申请人 FUJIFILM CORPORATION 发明人 SUGIHARA KOICHI;YAMADA SATORU;ANDOU TAKESHI
分类号 G03F7/039;G02F1/13;H01L21/027;H01L51/50 主分类号 G03F7/039
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