发明名称 METHOD FOR FORMING TRANSPARENT ELECTRODE
摘要 PROBLEM TO BE SOLVED: To provide a method of manufacturing a transparent electrode, including a tin oxide film capable of being easily patterned and realized at low cost and having a low resistance and excelling transparency. SOLUTION: The method of manufacturing the transparent electrode on the substrate of which the patterned tin oxide film is formed includes a step of forming a SnO<SB>2</SB>-x film (0.3≤x≤1.95) on a substrate; a step of removing a part of the SnO<SB>2</SB>-x film and patterning it; and a step of turning the patterned SnO<SB>2</SB>-x film into the tin oxide film, by heat treatment, or the method includes a step for forming a tin oxide film whose film density is 6.5 g/cm<SP>3</SP>or less on the substrate; a step of removing a part of the tin oxide film whose film density is 6.5 g/cm<SP>3</SP>or less and patterning it; and a step of turning the patterned tin oxide film whose film density is 6.5 g/cm<SP>3</SP>or less into a tin oxide film by heat treatment. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011082178(A) 申请公布日期 2011.04.21
申请号 JP20100249019 申请日期 2010.11.05
申请人 ASAHI GLASS CO LTD 发明人 MITSUI AKIRA;ODAKA HIDEFUMI;YONEMORI SHIGEAKI;AKAO YASUHIKO
分类号 H01B13/00;C01G19/02;C03C17/245;C23C14/08;C23C14/34;G02F1/1343;H01B5/14;H01J9/02;H01L31/18 主分类号 H01B13/00
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