发明名称 SUBSTRATE LIQUID PROCESSING APPARATUS, SUBSTRATE LIQUID PROCESSING METHOD, AND STORAGE MEDIUM HAVING SUBSTRATE LIQUID PROCESSING PROGRAM STORED THEREIN
摘要 Provided are a substrate liquid processing apparatus, a substrate liquid processing method, and a computer readable storage medium having a substrate liquid processing program stored therein that can prevent the occurrence of the electrostatic breakdown caused by the discharge of electric charges in a substrate. The substrate liquid processing apparatus processes a circuit-forming surface of the substrate with a chemical liquid. Furthermore, prior to processing the substrate with the chemical liquid, the substrate liquid processing apparatus performs an anti-static process for an surface opposite to the circuit-forming surface of the substrate by an anti-static liquid, thereby emitting the electric charges on the substrate.
申请公布号 US2011089137(A1) 申请公布日期 2011.04.21
申请号 US20100902721 申请日期 2010.10.12
申请人 TOKYO ELECTRON LIMITED 发明人 TANAKA HIROSHI;MINAMI TERUOMI;KAWABUCHI YOSUKE;ITO NORIHIRO;KAMIMURA FUMIHIRO;YABUTA TAKASHI;KOSAI KAZUKI;UNO TAKESHI;SEKIGUCHI KENJI;FUJII YASUSHI
分类号 H05K3/00 主分类号 H05K3/00
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