发明名称 TRANSFER-FREE BATCH FABRICATION OF SINGLE LAYER GRAPHENE DEVICES
摘要 A method of manufacturing one or more graphene devices is disclosed. A thin film growth substrate is formed directly on a device substrate. Graphene is formed on the thin film growth substrate. A transistor is also disclosed, having a device substrate and a source supported by the device substrate. The transistor also has a drain separated from the source and supported by the device substrate. The transistor further has a single layer graphene (SLG) channel grown partially on and coupling the source and the drain. The transistor also has a gate aligned with the SLG channel, and a gate insulator between the gate and the SLG channel. Integrated circuits and other apparati having a device substrate, a thin film growth substrate formed directly on at least a portion of the device substrate, and graphene formed directly on at least a portion of the thin film growth substrate are also disclosed.
申请公布号 WO2011046655(A2) 申请公布日期 2011.04.21
申请号 WO2010US42702 申请日期 2010.07.21
申请人 CORNELL UNIVERSITY;PARK, JIWOONG;RUIZ-VARGAS, CARLOS;LEVENDORF, MARK, PHILIP;BROWN, LOLA 发明人 PARK, JIWOONG;RUIZ-VARGAS, CARLOS;LEVENDORF, MARK, PHILIP;BROWN, LOLA
分类号 H01L21/336;H01L29/78 主分类号 H01L21/336
代理机构 代理人
主权项
地址