发明名称 VAPORIZER, SUBSTRATE PROCESSING APPARATUS, AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a vaporizer for suppressing persistence of a liquid raw material within the vaporizer when stopping generating a source gas and for facilitating cleaning the inside of a liquid raw material supply path. SOLUTION: The vaporizers 229s, 229b, 229t include: vaporizing chambers 51s, 51b, 51t for vaporizing the liquid raw material; heaters 61s, 61b, 61t for heating the inside of the vaporizing chambers; atomizing nozzles 31s, 31b, 31t for atomizing the liquid raw material into the vaporizing chambers; and a valve for controlling supply of a carrier gas, the liquid raw materials, and solvents into the atomizing nozzles. The valve is directly connected to the atomizing nozzles 31s, 31b, 31t. COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011082196(A) 申请公布日期 2011.04.21
申请号 JP20090230529 申请日期 2009.10.02
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 TAKAGI KOSUKE;IMAI YOSHINORI;YAMAMOTO TAKAHARU;HORII SADAYOSHI
分类号 H01L21/31;C23C16/448;H01L21/316 主分类号 H01L21/31
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