RADIATION-SENSITIVE COMPOSITION, METHOD FOR PRODUCING THE SAME AND RESIST PATTERN FORMING METHOD

摘要

PROBLEM TO BE SOLVED: To provide a radiation-sensitive composition having high solubility in a safe solvent and high sensitivity, and ensuring a good resist pattern shape, and also to provide a method for producing the same, and a resist pattern forming method using the radiation-sensitive composition.

SOLUTION: The radiation-sensitive composition contains a mixture of two or more cyclic compounds having a specific structure. The method for producing the same and the resist pattern forming method using the radiation-sensitive composition are also provided.

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