| 摘要 |
PROBLEM TO BE SOLVED: To provide an analyzing method and an analyzing device for a semiconductor substrate that can easily recover and analyze, at a low cost, metal impurity contaminants included in the semiconductor substrate. SOLUTION: Concentrated sulfuric acid 2 as a recovery liquid is supplied to the surface of the semiconductor substrate 1, a hydrophobic member 3 is disposed so as to hold the concentrated sulfuric acid 2 between itself and the semiconductor substrate 1 to bring the concentrated sulfuric acid 2 into wide contact with the semiconductor substrate 1, and after metal impurities included in the semiconductor substrate 1 are dissolved in the concentrated sulfuric acid 2, the hydrophobic member 3 is removed to analyze the concentrated sulfuric acid 2 left at least on one surface of the semiconductor substrate 1 and the hydrophobic member 3. It is preferable that the semiconductor substrate 1 is heated. COPYRIGHT: (C)2011,JPO&INPIT
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