| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of determining the deposition of molten metal to a die. SOLUTION: A processor sets a deposition determination criterion temperature T for the purpose of determining deposition of molten metal to a die after the molten metal is poured into the die. A CAE apparatus computes a plurality of molten metal temperatures Tf-Tj in a plurality of elapsed times after the start of pouring of the molten metal corresponding to a plurality of parts of the die. Thus, the determination is performed, as the range of occurrence of deposition, using the temperature range that the molten metal temperature is the deposition determination criterion temperature T or higher. The processor computes presence or absence of occurrence of deposition with an accumulated temperature for causing seizure phenomenon by multiplying excess temperature with the elapsed time through time quadrature, with the frequency of effective pouring displayed by colors on a screen by a CAD apparatus. Thus, by treating the deposition determination criterion temperature as the function of time-dependent temperature, a correct accumulated temperature can be calculated, thereby performing the highly accurate deposition determination. COPYRIGHT: (C)2011,JPO&INPIT
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