| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure apparatus which keeps desired performance by preventing liquid from remaining therein. <P>SOLUTION: The exposure apparatus capable of preventing liquid from remaining therein is provided. The exposure apparatus (EX) includes a substrate stage (ST1) capable of moving a substrate (P) while holding it, a measuring stage (ST2) capable of moving independently of the substrate stage (ST1), and a liquid immersion mechanism (12 or the like) for forming a liquid immersion region (LR) of liquid (LQ) on the upper surface of at least either of the substrate stage (ST1) and the measuring stage (ST2). The upper surface of the measuring stage (ST2) is formed with a recovery opening (51) capable of recovering the liquid (LQ). <P>COPYRIGHT: (C)2011,JPO&INPIT |
