发明名称 COPPER ELECTROLYTIC PLATING BATH AND COPPER ELECTROLYTIC PLATING METHOD
摘要 Disclosed herein is a copper electrolytic plating bath including copper sulfate used in an amount of 50 to 250 g/liter calculated as copper sulfate pentahydrate, 20 to 200 g/liter of sulfuric acid, and 20 to 150 mg/liter of a chloride ion, and a sulfur atom-containing organic compound and a nitrogen atom-containing organic compound serving as organic additives. The nitrogen atom-containing organic compound includes a nitrogen atom-containing polymer compound obtained by a two-stage reaction including reacting one mole of morpholine with two moles of epichlorohydrin in an acidic aqueous solution to obtain a reaction product and further reacting one to two moles, relative to one mole of the morpholine, of imidazole with the reaction product.
申请公布号 US2011089044(A1) 申请公布日期 2011.04.21
申请号 US20100903555 申请日期 2010.10.13
申请人 C. UYEMURA & CO., LTD. 发明人 ISONO TOSHIHISA;TACHIBANA SHINJI;OMURA NAOYUKI;HOSHI SHUNSAKU
分类号 C25D3/38 主分类号 C25D3/38
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