| 发明名称 |
NOVEL RESIN AND PHOTORESIST COMPOSITION COMPRISING THE SAME |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photoresist composition suitable for high performance applications such as high resolution sub-half micron and sub-quarter micron features. <P>SOLUTION: The photoresist composition comprises a resin comprising a moiety selected from formulae, wherein each R<SB>2</SB>is the same or different non-hydrogen substituent, and each n is an integer of 0-4. <P>COPYRIGHT: (C)2011,JPO&INPIT |
| 申请公布号 |
JP2011081340(A) |
申请公布日期 |
2011.04.21 |
| 申请号 |
JP20100115691 |
申请日期 |
2010.05.19 |
| 申请人 |
ROHM & HAAS ELECTRONIC MATERIALS LLC |
发明人 |
XU CHENG-BAI;ZAMPINI ANTHONY |
| 分类号 |
G03F7/039;C08F20/28;H01L21/027 |
主分类号 |
G03F7/039 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
