| 摘要 |
<p>Provided are: a sintered target comprising bismuth (Bi), germanium (Ge), and oxygen (O); a manufacturing method therefor; and an optical recording medium. Said Bi-Ge-O sintered sputtering target is characterized in that the relationship between the number of bismuth atoms and the number of germanium atoms satisfies the relation 0.57 < (Bi/(Bi+Ge)) 12GeO20, Bi4Ge3O12, and GeO2. The provided target does not crack upon sputtering, generates few particulates, allows fabrication of stably high-quality thin films, and makes it possible to obtain an optical recording medium with no errors in recorded bits.</p> |
