| 摘要 |
<P>PROBLEM TO BE SOLVED: To supply a cleaning liquid, having a rate of a base liquid and an emulsified component within a desirable work region, to an immersion system to be cleaned. <P>SOLUTION: A cleaning liquid supply apparatus is configured to supply an emulsified cleaning fluid to an immersion lithographic apparatus. The apparatus includes a mixer configured to mix an additive fluid from an additive fluid supply section and an immersion liquid from an immersion supply section so as to prepare the emulsified cleaning fluid, a sensor system configured to sense physical characteristics of the emulsified cleaning fluid, and a controller connected to the sensor and mixer. The controller controls the supply of the additive fluid from the additive fluid supply section to the mixer and physical characteristics of the emulsified cleaning fluid. <P>COPYRIGHT: (C)2011,JPO&INPIT |
