| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a resist composition which enables to obtain a pattern having excellent resolution and line edge roughness. <P>SOLUTION: The resist composition comprises: a resin which has an acid-labile group, is insoluble or slightly soluble in an aqueous alkali solution, and can be dissolved in an aqueous alkali solution by the action of an acid; an acid generator; a basic compound; and a boron-containing compound. The boron-containing compound is preferably a compound represented by formula (D), wherein R<SP>1</SP>-R<SP>4</SP>each independently represents phenyl which may have a substituent, and Z<SP>D1+</SP>represents an organic cation. <P>COPYRIGHT: (C)2011,JPO&INPIT |
