| 发明名称 |
APPARATUS AND METHOD OF VAPOR COATING IN AN ELECTRONIC DEVICE |
| 摘要 |
An apparatus and method for vapor phase deposition of a reactive surface area (RSA) material onto a substrate of an electronic device. The vapor phase deposition is conducted at ambient pressures in air, and provides capture of residual vapor to minimize environmental release of RSA and other constituents used in the processing. |
| 申请公布号 |
US2011092076(A1) |
申请公布日期 |
2011.04.21 |
| 申请号 |
US20090993202 |
申请日期 |
2009.05.19 |
| 申请人 |
E.I. DU PONT DE NEMOURS AND COMPANY |
发明人 |
LANG CHARLES D.;TREMEL JAMES DANIEL;SANT PAUL ANTHONY;SORICH STEPHEN;FLATTERY DAVID K.;JOHANSSON GARY A.;FELDMAN JERALD;ITTEL STEVEN DALE;SIMPSON GEORGE |
| 分类号 |
H01L21/02;C23C16/00 |
主分类号 |
H01L21/02 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
