发明名称 THIN-FILM TRANSISTOR, PROCESS FOR PRODUCTION OF SAME, AND DISPLAY DEVICE EQUIPPED WITH SAME
摘要 <p>Disclosed are: a thin-film transistor which can be operated at a high speed; a process for producing the thin-film transistor; and a display device equipped with the thin-film transistor. Specifically disclosed is a bottom-gate-type thin-film transistor comprising a gate electrode, a gate insulating film, an oxide semiconductor film and a protective insulating film laminated in this order on a substrate, wherein the planar shape of the protective insulating film completely or substantially corresponds to that of the gate electrode. Preferably, the thin-film transistor additionally comprises a source/drain electrode which is connected to a channel formed in the oxide semiconductor film, the source/drain electrode and the oxide semiconductor film are formed using an identical semiconductor layer, and the source/drain electrode is formed by reducing a part of the semiconductor layer.</p>
申请公布号 WO2011045960(A1) 申请公布日期 2011.04.21
申请号 WO2010JP60309 申请日期 2010.06.17
申请人 SHARP KABUSHIKI KAISHA;OKABE TOHRU;CHIKAMA YOSHIMASA 发明人 OKABE TOHRU;CHIKAMA YOSHIMASA
分类号 H01L29/786;G02F1/1333;G02F1/1368;H01L21/336 主分类号 H01L29/786
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