发明名称 |
THIN-FILM TRANSISTOR, PROCESS FOR PRODUCTION OF SAME, AND DISPLAY DEVICE EQUIPPED WITH SAME |
摘要 |
<p>Disclosed are: a thin-film transistor which can be operated at a high speed; a process for producing the thin-film transistor; and a display device equipped with the thin-film transistor. Specifically disclosed is a bottom-gate-type thin-film transistor comprising a gate electrode, a gate insulating film, an oxide semiconductor film and a protective insulating film laminated in this order on a substrate, wherein the planar shape of the protective insulating film completely or substantially corresponds to that of the gate electrode. Preferably, the thin-film transistor additionally comprises a source/drain electrode which is connected to a channel formed in the oxide semiconductor film, the source/drain electrode and the oxide semiconductor film are formed using an identical semiconductor layer, and the source/drain electrode is formed by reducing a part of the semiconductor layer.</p> |
申请公布号 |
WO2011045960(A1) |
申请公布日期 |
2011.04.21 |
申请号 |
WO2010JP60309 |
申请日期 |
2010.06.17 |
申请人 |
SHARP KABUSHIKI KAISHA;OKABE TOHRU;CHIKAMA YOSHIMASA |
发明人 |
OKABE TOHRU;CHIKAMA YOSHIMASA |
分类号 |
H01L29/786;G02F1/1333;G02F1/1368;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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