| 摘要 |
<p>Data relating to the thickness of a thin film, for example, a thickness change is determined herein as follows. Said film is arranged onto a substrate so that said film and substrate form, in a whole, an interferometric structure. After that optical radiation is emitted towards the interferometric structure formed by the film and the substrate, and optically reflected from said interferometric structure radiation is measured. Said thin film thickness related data, for example, thickness change, is then determined by means of said optically reflected radiation, for example, of spectrum related information.</p> |
