| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a compound suitable as an acid generator for a resist composition, an acid generator made of the compound, a resist composition including the acid generator, and a resist pattern forming method using the resist composition. <P>SOLUTION: The compound is represented by general formula (b1-15), wherein R<SP>7"</SP>is aryl which may have a substituent; R<SP>8"</SP>is 2-adamantyl which may have a substituent, provided that the 2-adamantyl has no substituent in the 2-position to which S bonds; R<SP>9"</SP>is straight chain or branched chain alkyl; and X<SP>-</SP>is an anion. The acid generator is made of the compound. The resist composition includes a base component (A) whose solubility in an alkali developer changes by the action of an acid and an acid generator component (B) which generates an acid upon exposure, wherein the acid generator component (B) includes an acid generator (B1) made of the compound. <P>COPYRIGHT: (C)2011,JPO&INPIT |
