| 摘要 |
PROBLEM TO BE SOLVED: To provide a catalytic chemical vapor deposition device that can form a film with desired precision while suppressing twisting of a catalyst line suspended in a chamber to be folded back in a vertical direction, especially, a catalytic chemical vapor deposition device which is effective for forming the film in a film formation region of large area. SOLUTION: When the catalyst line 6 is twisted clockwise on a Z axis, a folded-back part 63 leaves columnar parts 30b and 30c and rotates around the Z axis in a direction as shown by an arrow in the figure so as to approach the columnar parts 30a and 30b. An end of the folded-back part 63, having rotated, on the side of a droop part 61 abuts against the columnar part 30a, and an end on the side of a droop part 62 abuts against the columnar part 30d to restrict the twisting of the catalyst line 6 in a Y-axial direction. At this time, the droop pat 62 leaves a flat plate part 20 and the droop part 61 shifts in position to approach the flat plate part 20. The droop part 61 of the catalyst line 6 which has shifted in position abuts against an end 21c of the flat plate part 20 to restrict the position shift of the catalyst line 6 in an X-axial direction. COPYRIGHT: (C)2011,JPO&INPIT |
