| 摘要 |
<p>Provided is a light source apparatus that has a long lifespan as a light source, and wherein the luminescence intensity of vacuum-ultraviolet light is improved, as well as a surface processing method that uses the light source apparatus, and has excellent surface processing efficiency. This light source device, which supplies inert gas into a discharge space under atmospheric pressure or pressure in the vicinity thereof, and irradiates light emitted from plasma generated by forming a high frequency electric field in the discharge space, is characterized in that the inert gas contains carbonic acid gas, and that the frequency of the high frequency electric field to be formed is the microwave band.</p> |
