发明名称 PHOTOCURABLE COMPOSITION.
摘要 <p>A method for the preparation of a photocurable resin by a reaction comprising the following steps i) reacting a mixture of a novolak type epoxy resin (A) and a dicyclopentadiene-phenol glycidylether resin (B) with ii) an advancement component (C) containing at least 2 phenolic hydroxyl groups per molecule; iii) reacting with an unsaturated monocarboxylic acid (D); and iv) esterification of the unsaturated group containing resin obtained from the steps of i) to iii) with a polycarboxylic acid anhydride or a carboxylic acid anhydride (E) is disclosed.</p>
申请公布号 MX2011002678(A) 申请公布日期 2011.04.21
申请号 MX20110002678 申请日期 2009.06.12
申请人 HUNTSMAN ADVANCED MATERIALS SWITZERLAND GMBH 发明人 SABINE PIERAU;KAI DUDDE;MARTIN ROTH
分类号 C08G59/14;C08G59/24;C08G59/42;C08G59/62;C08L63/10;C09D163/10 主分类号 C08G59/14
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