发明名称 |
PHOTOCURABLE COMPOSITION. |
摘要 |
<p>A method for the preparation of a photocurable resin by a reaction comprising the following steps i) reacting a mixture of a novolak type epoxy resin (A) and a dicyclopentadiene-phenol glycidylether resin (B) with ii) an advancement component (C) containing at least 2 phenolic hydroxyl groups per molecule; iii) reacting with an unsaturated monocarboxylic acid (D); and iv) esterification of the unsaturated group containing resin obtained from the steps of i) to iii) with a polycarboxylic acid anhydride or a carboxylic acid anhydride (E) is disclosed.</p> |
申请公布号 |
MX2011002678(A) |
申请公布日期 |
2011.04.21 |
申请号 |
MX20110002678 |
申请日期 |
2009.06.12 |
申请人 |
HUNTSMAN ADVANCED MATERIALS SWITZERLAND GMBH |
发明人 |
SABINE PIERAU;KAI DUDDE;MARTIN ROTH |
分类号 |
C08G59/14;C08G59/24;C08G59/42;C08G59/62;C08L63/10;C09D163/10 |
主分类号 |
C08G59/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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