| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a method for correcting defects of a photomask which stably and reliably corrects various types of defects caused by foreign substances, based on materials, shapes, sizes and adhesive degrees. <P>SOLUTION: The defect correction method for a photomask includes removing a foreign matter defect on a photomask by use of a plurality of probes. That is, a foreign substance defect on a photomask is removed and corrected by preparing a plurality of probes, simultaneously bringing at least two probes into contact with a foreign substance on a photomask surface, holding the foreign substance at least at three different positions, and parting the foreign substance away from the photomask surface. <P>COPYRIGHT: (C)2011,JPO&INPIT</p> |
