PHOTORESIST COMPOSITION

摘要

PURPOSE: A photo-resist composition is provided to prevent the remaining rate and the resolution of photo-resist from being reduced by including a compound with a specific chemical structure. CONSTITUTION: A photo-resist composition includes alkaline soluble resin, a photosensitive agent, one or more selected from compounds represented by chemical formula 1 to chemical formula 3, and a solvent. The photosensitive agent includes quinonediazide group. The alkaline soluble resin is cresol novolak resin. The cresol novolak resin is obtained by condensing formaldehyde and the mixture of m-cresol and p-cresol.