发明名称 |
CATALYTIC CVD DEVICE, METHOD FOR FORMATION OF FILM, PROCESS FOR PRODUCTION OF SOLAR CELL, AND SUBSTRATE HOLDER |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a catalytic CVD device, a method for formation of a film, a process for production of a solar cell, and a substrate holder. <P>SOLUTION: In the catalytic CVD device 100, the holder 300 has an antireflective structure for preventing the reflection of a radiant ray ejected from a catalyst wire 11 toward the side of a substrate 200. <P>COPYRIGHT: (C)2011,JPO&INPIT |
申请公布号 |
JP2011080095(A) |
申请公布日期 |
2011.04.21 |
申请号 |
JP20090230589 |
申请日期 |
2009.10.02 |
申请人 |
SANYO ELECTRIC CO LTD;ULVAC JAPAN LTD |
发明人 |
SHIMA MASAKI;WAKAMIYA TOSHINORI;OSONO SHUJI;OKAYAMA TOMOHIKO;OGATA HIDEYUKI |
分类号 |
C23C16/44;C23C16/24;H01L21/205 |
主分类号 |
C23C16/44 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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