发明名称 CATALYTIC CVD DEVICE, METHOD FOR FORMATION OF FILM, PROCESS FOR PRODUCTION OF SOLAR CELL, AND SUBSTRATE HOLDER
摘要 <P>PROBLEM TO BE SOLVED: To provide a catalytic CVD device, a method for formation of a film, a process for production of a solar cell, and a substrate holder. <P>SOLUTION: In the catalytic CVD device 100, the holder 300 has an antireflective structure for preventing the reflection of a radiant ray ejected from a catalyst wire 11 toward the side of a substrate 200. <P>COPYRIGHT: (C)2011,JPO&INPIT
申请公布号 JP2011080095(A) 申请公布日期 2011.04.21
申请号 JP20090230589 申请日期 2009.10.02
申请人 SANYO ELECTRIC CO LTD;ULVAC JAPAN LTD 发明人 SHIMA MASAKI;WAKAMIYA TOSHINORI;OSONO SHUJI;OKAYAMA TOMOHIKO;OGATA HIDEYUKI
分类号 C23C16/44;C23C16/24;H01L21/205 主分类号 C23C16/44
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