发明名称 PRESSURE-SENSITIVE ADHESIVE FILM AND BACK-GRINDING METHOD USING THE SAME
摘要 The present invention relates to a pressure-sensitive adhesive film and a semiconductor wafer backgrinding method using the same. The present invention provides a pressure-sensitive adhesive film capable of remarkably improving production efficiency in a wafer backgrinding of a semiconductor manufacturing process due to its superior cutting and adherence properties in the semiconductor manufacturing process and an excellent cushioning property. Moreover, the present invention also provides a pressure-sensitive adhesive film having superior peeling and re-peeling properties and wettability to the wafer while providing excellent water resistance, and a backgrinding method using the pressure-sensitive adhesive film.
申请公布号 US2011091676(A1) 申请公布日期 2011.04.21
申请号 US20090988774 申请日期 2009.04.21
申请人 LG CHEM, LTD 发明人 KIM SE RA;BAEK YOON JEON;KIM JAN SOON;SON HYUN HEE;HONG JONG WAN;PARK HYUN WOO
分类号 C09J7/02;B24B1/00;B32B5/00;B32B33/00;C09J133/08;C09J133/10 主分类号 C09J7/02
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