发明名称 |
Method of fabricating electron-emitting device and method of manufacturing image display apparatus |
摘要 |
<p>The following method is provided: a method of readily fabricating an electron-emitting device (10), coated with a low-work function material, having good electron-emitting properties with high reproducibility. Differences in electron-emitting properties between electron-emitting devices each fabricated by the method are reduced. Before a structure (3) is coated with the low-work function material, a metal oxide layer (4) is formed on the structure (3).
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申请公布号 |
EP2194563(A3) |
申请公布日期 |
2011.04.20 |
申请号 |
EP20090175519 |
申请日期 |
2009.11.10 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
AOKI, NAOFUMI;NISHIDA, SHOJI |
分类号 |
H01J9/02;H01J1/304;H01J31/12 |
主分类号 |
H01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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