POSITIVE PHOTORESIST COMPOSITION

摘要

PURPOSE: A positive photo-resist composition is provided to improve operational environment and be used for a real industrial field by reducing the generation amount of bad odors. CONSTITUTION: A positive photo-resist composition includes a novolak resin, a diazide-based photosensitive compound, and a mixing solvent. 40 to 80 weight% of propylene glycol monomethyl ether acetate, 10 to 40 weight% of ethyl 2-hydroxy propionate, and 1 to 20 weight% of γ-butyrolactone are contained with respect to total weight of the mixing solvent. The novolak resin is a cresol novolak resin obtained by condensing formaldehyde and the mixture of m-cresol and p-cresol.