| 发明名称 |
PATTERNED INTEGRATED CIRCUIT AND METHOD OF PRODUCTION THEREOF |
| 摘要 |
The present invention relates generally to the field of integrated electronics. More specifically, the present invention relates to patterned graphene-like carbon-based integrated circuits and methods of production thereof. Methods of photo-, electron-beam projection, extreme-ultraviolet, and imprint lithographic patterning and also several thermal patterning methods are disclosed in the present invention. |
| 申请公布号 |
EP2311078(A1) |
申请公布日期 |
2011.04.20 |
| 申请号 |
EP20090771083 |
申请日期 |
2009.06.26 |
| 申请人 |
CARBEN SEMICON LIMITED |
发明人 |
DUVALL, STEVEN, GRANT;KHOKHLOV, PAVEL;LAZAREV, PAVEL, I. |
| 分类号 |
H01L21/461;H01L29/16;H01L51/05 |
主分类号 |
H01L21/461 |
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