发明名称 Contact structure for a semiconductor material and a method for providing such structure
摘要 <p>The present invention is related a contact structure comprising: a substrate (1) of semiconductor material having an interface on one of its surfaces, and an electrical contact at the interface of said substrate of semiconductor material comprising a granular metal layer.</p>
申请公布号 EP1626449(B1) 申请公布日期 2011.04.20
申请号 EP20050447181 申请日期 2005.08.12
申请人 IMEC 发明人 ARKHIPOV, VLADIMIR;HEREMANS, PAUL
分类号 H01L51/52;H01L51/10;H01L51/44 主分类号 H01L51/52
代理机构 代理人
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