SUPPORT MEMBER AND APPARATUS FOR TREATING SUBSTRATE WITH THE SAME

摘要

PURPOSE: A support member and an apparatus for treating a substrate with the same are provided to improve the efficiency of processing a substrate by preventing a process liquid from remaining on a chucking pin. CONSTITUTION: In a support member and an apparatus for treating a substrate with the same, a chamber(10) provides a sealed internal space. A support member(120) supports a wafer inside a reaction chamber, and it includes a spin head and a rotating shaft. A driving member drives the support member. An injection member(140) injects a processing liquid to the wafer.