A method of forming a patterned substrate is provided. The method includes providing a substrate (300) having a structured surface region comprising one or more recessed features (310). The method includes disposing a first liquid (325) onto at least a portion of the structured surface region. The method includes contacting the first liquid with a second liquid (330). The method includes displacing the first liquid with the second liquid from at least a portion (315) of the structured surface region. The first liquid is selectively located in at least a portion of the one or more recessed features.
申请公布号
EP2311301(A1)
申请公布日期
2011.04.20
申请号
EP20090773971
申请日期
2009.05.26
申请人
3M INNOVATIVE PROPERTIES COMPANY
发明人
MORAN, CRISTIN, E.;FREY, MATTHEW, H.;STAY, MATTHEW, S.;PEKUROVSKY, MIKHAIL, L.