发明名称 |
Film stacks to prevent UV-induced device damage |
摘要 |
A film stack includes an interlayer dielectric formed over one or more devices. The film stack further includes a first layer having a high extinction coefficient formed on the interlayer dielectric and a second layer having a low extinction coefficient formed on the first layer. The first and second layers prevent ultraviolet induced damage to the one or more devices while minimizing reflectivity for lithographic processes.
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申请公布号 |
US7927723(B1) |
申请公布日期 |
2011.04.19 |
申请号 |
US20050091524 |
申请日期 |
2005.03.29 |
申请人 |
SPANSION LLC;GLOBALFOUNDRIES INC. |
发明人 |
HUI ANGELA T.;CHENG NING;NGO MINH VAN;TOKUNO HIROKAZU;LI WENMEI |
分类号 |
G02B1/10;B32B9/00;B32B19/00;G02B5/28 |
主分类号 |
G02B1/10 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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