发明名称 Gate structures in semiconductor devices
摘要 A gate structure includes an insulation layer on a substrate, a first conductive layer pattern on the insulation layer, a metal ohmic layer pattern on the first conductive layer pattern, a diffusion preventing layer pattern on the metal ohmic layer pattern, an amorphous layer pattern on the diffusion preventing layer pattern, and a second conductive layer pattern on the amorphous layer pattern. The gate structure may have a low sheet resistance and desired thermal stability.
申请公布号 US7928498(B2) 申请公布日期 2011.04.19
申请号 US20090428303 申请日期 2009.04.22
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHA TAE-HO;CHEONG SEONG-HWEE;CHOI GIL-HEYUN;KIM BYUNG-HEE;PARK HEE-SOOK;BAEK JONG-MIN
分类号 H01L29/788 主分类号 H01L29/788
代理机构 代理人
主权项
地址