A METHOD FOR PLASMA ETCHING PERFORMANCE ENHANCEMENT,申请号KR20057006281-传众专利搜索

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发明名称	A METHOD FOR PLASMA ETCHING PERFORMANCE ENHANCEMENT
摘要
申请公布号	KR101029947(B1)	申请公布日期	2011.04.19
申请号	KR20057006281	申请日期	2003.10.06
申请人		发明人
分类号	H01L21/02;H01L21/311;H01L21/768	主分类号	H01L21/02
代理机构		代理人
主权项
地址

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