发明名称 Full-wafer or large area imprinting with multiple separated sub-fields for high throughput lithography
摘要 A layer on a substrate is formed using an imprint lithography system. The layer is formed by providing a plurality of flowable regions on the substrate, spreading material in the flowable regions, and contacting the regions with a plurality of imprint lithography molds that are disposed on a template.
申请公布号 US7927541(B2) 申请公布日期 2011.04.19
申请号 US20090430428 申请日期 2009.04.27
申请人 MOLECULAR IMPRINTS, INC. 发明人 SREENIVASAN SIDLGATA V.
分类号 B29C59/00;B29C33/40;B29C67/00;G03F7/00 主分类号 B29C59/00
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