发明名称 Method of forming metal interconnect layers for flip chip device
摘要 The semiconductor device 1 includes interconnect layers 10, 20, an IC chip 30, via plugs 42, 44, a seal resin 50, and solder balls 60. The interconnect layer 10 includes a via plug 42. An end face of the via plug 42 on the side of the interconnect layer 20 is smaller in area than the opposite end face, i.e. the end face on the side of the IC chip 30. An end face of the via plug 44 on the side of the interconnect layer 10 is smaller in area than the opposite end face, i.e. the end face on the side of the solder balls 60. The thermal decomposition temperature of the insulating resin 14 constituting the interconnect layer 10 is higher than that of the insulating resin 24 constituting the interconnect layer 20.
申请公布号 US7927999(B2) 申请公布日期 2011.04.19
申请号 US20060393686 申请日期 2006.03.31
申请人 RENESAS ELECTRONICS CORPORATION 发明人 KURITA YOICHIRO;KAWANO MASAYA;SOEJIMA KOJI
分类号 H01L21/4763 主分类号 H01L21/4763
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