发明名称 Environmental system including a transport region for an immersion lithography apparatus
摘要 A lithographic projection apparatus that is arranged to project a pattern from a patterning device onto a substrate using a projection system has a liquid supply system arranged to supply a liquid to a space between the projection system and the substrate. The apparatus also includes a liquid collecting system having a liquid collection member having a liquid-permeable member through which a liquid is collected from a surface of an object opposite to the liquid collection member.
申请公布号 US7929110(B2) 申请公布日期 2011.04.19
申请号 US20070819446 申请日期 2007.06.27
申请人 NIKON CORPORATION 发明人 NOVAK W. THOMAS;HAZELTON ANDREW J.;WATSON DOUGLAS C.
分类号 G03B27/42;G03F;G03F7/20 主分类号 G03B27/42
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